Equipment Engineer, Photo and Ebeam Lithography Development, Microelectronics Research Center Full-time

Equipment Engineer, Photo and Ebeam Lithography Development, Microelectronics Research Center

The Lithography Engineer leads development, optimization, and sustainment of advanced lithography processes in a shared-user research cleanroom. The role focuses on direct-write lithography techniques, including photolithography and electron-beam lithography, with strong integration of metrology to achieve precise linewidth control, overlay accuracy, and pattern fidelity. This role is also expected to work as part of a team to ensure optimal tool performance for photolithography and electron-beam lithography systems through calibration, diagnostics, maintenance coordination, and performance monitoring. The engineer supports microfabrication research and prototyping through maintaining tool availability, exposure accuracy, overlay performance, and system stability, while working in close coordination with process engineers, technicians, and users for recipe development, experimental design, data analysis, user training, and equipment diagnostics.

Tool Performance, Reliability, and Sustainment

• Maintain and optimize the performance of photolithography and electron-beam lithography equipment to meet facility capability and uptime targets.
• Troubleshoot process deviations and tool-related issues using structured root cause analysis.
• Monitor key tool performance metrics, including exposure stability, overlay accuracy, focus control, beam current stability, and stage performance.
• Perform routine performance verification, tool matching, and calibration to ensure consistent and repeatable operation.
• Perform diagnostic testing and hardware troubleshooting in coordination with maintenance staff and vendors.
• Support tool qualification, calibration, acceptance testing, and preventive maintenance activities.

Diagnostics, Troubleshooting, and Repair

• Diagnose and resolve equipment-related issues impacting lithography performance using systematic troubleshooting and root cause analysis.
• Perform diagnostic testing and hands-on hardware troubleshooting, including replacement of boards, sensors, stages, vacuum components, and mechanical assemblies.
• Support preventive maintenance planning and execution to minimize downtime and performance drift.

Process Development and Optimization

• Assist users to develop, optimize, and document photolithography and electron-beam lithography processes for a wide range of device structures and materials as needed.
• Assist users in designing and executing experiments to push tool and process limits in resolution, contrast, sidewall quality, and pattern fidelity.
• Assist users to address proximity effects, resist behavior, exposure strategies, and process bias through systematic experimentation and modeling.

Metrology and Data Integration

• Utilize lithography-related metrology (e.g., optical inspection, SEM, AFM, overlay and CD measurements) to validate tool performance ensure precise linewidth control and overlay accuracy.
• Correlate metrology results with tool settings and hardware condition to identify performance trends and degradation.
• Support tool acceptance testing, requalification after maintenance, and periodic performance audits.
• Analyze lithography and metrology data to support process control and reproducibility.
• Correlate lithographic results with downstream etch or deposition outcomes to optimize pattern transfer.

User Support, Training, and Documentation

• Develop and maintain equipment-related documentation, including operating procedures, maintenance records, calibration logs, and performance baselines.
• Ensure compliance with cleanroom safety standards, equipment interlocks, and chemical handling requirements.
• Train and certify users on lithography tools and processes, ensuring safe and effective operation in a shared facility environment.
• Provide technical consultation to researchers on lithography strategy, design rules, and integration considerations.

Collaboration and Integration

• Work closely with researchers, engineers and technicians to align tool performance with process requirements.
• Support downstream integration by ensuring lithography tools meet performance needs for etching, deposition, and lift-off processes.
• Participate in facility planning related to tool upgrades, replacements, and capability expansion.
• Collaborate with other process engineers, technicians, and researchers to support process transfer, yield improvement, and multi-step process integration.
• Participate in interdisciplinary projects involving lithography, metrology, etching, and deposition.

Required Qualifications

• Bachelor's degree in Electrical Engineering, Materials Science, Physics, or a related field.
• Minimum of 3 years of experience in supporting lithography process development, with emphasis on direct-write techniques.
• Strong understanding of lithography tool subsystems, including optics, electron optics, stages, vacuum systems, motion control, and electronics.
• Strong understanding of lithographic resolution limits, proximity effects, overlay control, and resist chemistry.
• Experience preparing and converting GDS or equivalent layout files for lithography tools.
• Demonstrated experience with equipment diagnostics, troubleshooting, and component-level repair.
• Familiarity with cleanroom operations, safety protocols, and vacuum-based systems.

Preferred Qualifications

• Master's degree in Electrical Engineering, Materials Science, Physics, or a related field.
• Experience supporting photolithography steppers, mask aligners, or electron-beam lithography systems in a research or pilot-line environment.
• Familiarity with overlay and CD performance metrics and their dependence on tool hardware and calibration.
• Experience interfacing with vendors for service, upgrades, and tool performance optimization.
• Exposure to data analysis or scripting (e.g., Python) for tool monitoring, performance trending, or log analysis.
• Prior experience in a shared-user academic or national lab cleanroom environment.
• Experience with multi-layer alignment strategies and advanced registration techniques.
• Exposure to optical CD metrology, spectroscopic ellipsometry, or related thin-film characterization methods.
• Proficiency in Python or similar scripting languages for data analysis, automation, or metrology workflows.
• Prior work in a shared-user research facility or academic cleanroom environment.

Salary

$90,000 + depending on qualifications

Working Conditions

• Uniforms and/or personal protection equipment (furnished)
• May work in all weather conditions
• May work in extreme temperatures
• May work around chemical fumes
• May work around standard office conditions
• May work around biohazards
• May work around chemicals
• May work around electrical and mechanical hazards
• Use of manual dexterity
• Climbing of stairs
• Climbing of ladders
• Lifting and moving
• Occasional weekend, overtime and evening work to meet deadlines
• Field work as necessary
• Cleanroom Environment
• Yellow lighting in Lithography areas
• Noisy environment

Required Materials

Please mark “yes” on the application for required materials. Failure to attach all additional materials listed may affect candidates being considered for the position.

• Resume/CV
• 3 work references with their contact information; at least one reference should be from a supervisor.
• Letter of interest